Samsung to Receive Two ASML High-NA EUV Lithography Machines
Samsung is advancing its semiconductor manufacturing capabilities with the upcoming installation of two High-NA EUV lithography systems from ASML, scheduled to be operational in the first half of 2026.
According to TrendForce, the first EXE:5200B unit will arrive at Samsung’s foundry later in 2025, while a second is expected in early 2026. The EXE:5200B represents ASML’s first commercially ready High-NA EUV platform capable of supporting volume production.
- Intel deployed prototype High-NA EUV systems in 2023.
- TSMC deployed prototype High-NA EUV systems in mid-2024.
- SK Hynix installed the same system at its M16 facility for advanced DRAM production last month.
Samsung’s adoption of High-NA EUV will play a central role in its 2nm process roadmap, with plans to manufacture the Exynos 2600 SoC and Tesla’s next-generation AI accelerator.
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Author's summary: Samsung advances semiconductor manufacturing with ASML High-NA EUV lithography systems.